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Effect of in-plane shear strain on phase states and dielectric properties of epitaxial ferroelectric thin films

机译:面内剪切应变对外延铁电薄膜相态和介电性能的影响

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摘要

A modified thermodynamic potential based on the eight-order Landau-Devonshire polynomial is derived for ferroelectric thin films grown on dissimilar substrates that induce anisotropic tensile/compressive strains and the shear strain in the film plane. The effect of the shear strain on the ferroelectric phase transition occurring in considered films is analyzed theoretically. It is shown that the application of the shear strain suppresses the formation of ferroelectric c phase and raises the temperature of aa* phase formation. The directional dependence of in-plane dielectric permittivity of a ferroelectric film is also calculated and compared with the dependence observed in (Ba0.60Sr0.40)TiO3 films deposited on NdGaO3. (c) 2008 American Institute of Physics.
机译:基于八阶Landau-Devonshire多项式的修正热力学势是针对在异种基板上生长的铁电薄膜而得出的,这些铁电薄膜在薄膜平面中引起各向异性的拉伸/压缩应变和剪切应变。理论上分析了剪切应变对考虑的薄膜中发生的铁电相变的影响。结果表明,施加剪切应变可以抑制铁电c相的形成,并提高aa *相的形成温度。还计算了铁电膜的平面内介电常数的方向依赖性,并将其与在NdGaO3上沉积的(Ba0.60Sr0.40)TiO3膜中观察到的依赖性进行了比较。 (c)2008年美国物理研究所。

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